Developing loading effect on lithography I-line process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7140, Issue , 2008, Pages

  Huang, Thomas ^a   Wang, Walter ^a   Huang, Chun Yen ^a   Tseng, Nick ^a   Guo, Ting Jhen ^a   Shih, Chiang Lin ^a   Wu, Wen Bin ^a  

^a NANYA TECHNOLOGY CORPORATION   (Taiwan)

Author keywords

CD uniformity; Loading effect; Pattern density; Transmission rate

Indexed keywords

CD UNIFORMITY; CRITICAL DIMENSIONS; DEVELOPING PROCESS; DEVELOPING SOLUTIONS; DRAM TECHNOLOGIES; FEATURE SIZES; FREE LOADINGS; LINE PROCESS; LOADING EFFECT; NON-UNIFORM; NOZZLE DESIGNS; PARAMETERS SETTINGS; PATTERN DENSITY; SEMICONDUCTOR MANUFACTURERS; TRANSMISSION RATE;

INTELLIGENT ROBOTS; LOADING; MICROCHANNELS; PHOTORESISTS;

DATA STORAGE EQUIPMENT;

EID: 62449083360     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.804659     Document Type: Conference Paper

References (5)

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4. Daniel Courboin, Jong Woo Choi, Sang Hyun Jung, Seung Hee Baek, Lee Ju Kim, High flow rate development: Process optimization using Megasonic Immersion Development (MID), BACUS 5567, 26(2004)
5. Daniel Courboin, JongWoo Choi, Sang Hyun Jung, Seung Hee Baek, Lee Ju Kim, Chang Nam Ahn, Hong Seok Kim, Investigations on microloading effect: A parallel approach to PGSD (Proximity Gap Suction Development), Proc. SPIE 5446, 106(2004)