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Applied Physics A: Materials Science and Processing

Volumn 95, Issue 2, 2009, Pages 579-587

Growth and characterization of nanostructured anatase phase TiO2 thin films prepared by DC reactive unbalanced magnetron sputtering

(4) Chaiyakun, Surasing a Pokaipisit, Artorn a Limsuwan, Pichet a Ngotawornchai, Boonlaer b

a KING MONGKUT'S UNIVERSITY OF TECHNOLOGY THONBURI (Thailand)

b CHULALONGKORN UNIVERSITY (Thailand)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; ELECTRODEPOSITION; FIELD EMISSION; GRAIN SIZE AND SHAPE; INORGANIC COATINGS; MAGNETRONS; OPTICAL MICROSCOPY; OPTICAL PROPERTIES; SCANNING ELECTRON MICROSCOPY; SPECTROSCOPIC ELLIPSOMETRY; TITANIUM; TITANIUM DIOXIDE; TITANIUM OXIDES; TRANSMISSION ELECTRON MICROSCOPY;

ANATASE FILMS; ANATASE PHASE; ATOMIC-FORCE MICROSCOPIES; CRYSTALLINITY; DEPOSITION CONDITIONS; DEPOSITION TIME; FIELD EMISSION-SCANNING ELECTRON MICROSCOPIES; GRAIN SIZES; NANO-STRUCTURED; POLY-CRYSTALLINE; REACTIVE UNBALANCED MAGNETRON SPUTTERING; SPUTTERING CURRENTS; TEM; TITANIUM DIOXIDE THIN FILMS; UNBALANCED MAGNETRON SPUTTERING; UNHEATED SUBSTRATES; X-RAY DIFFRACTIONS;

THIN FILMS;

EID: 62349090715 PISSN: 09478396 EISSN: 14320630 Source Type: Journal
DOI: 10.1007/s00339-008-4954-8 Document Type: Article

Times cited : (23)

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