Epitaxial SrRuO3 thin films deposited on SrO buffered-Si(001) substrates for ferroelectric Pb(Zr0.2Ti0.8)O3 thin films

Metals and Materials International

Volumn 15, Issue 1, 2009, Pages 89-94

  Xian, Cheng Ji ^a   Seong, Nak Jin ^a   Yoon, Soon Gil ^a  

^a Chungnam National University   (South Korea)

Author keywords

Epitaxial SrRuO3; Hysteresis loop; PZT; SrO buffered Si

Indexed keywords

BUFFER LAYERS; CRYSTALLINITY; ELECTRODES; FERROELECTRIC FILMS; HYSTERESIS LOOPS; LEAD COMPOUNDS; OXIDE FILMS; PULSED LASER DEPOSITION; RUTHENIUM COMPOUNDS; SILICON COMPOUNDS; SILICON OXIDES; SUBSTRATES; THIN FILMS; TITANIUM COMPOUNDS; ZIRCONIUM COMPOUNDS;

DEPOSITION PRESSURES; DEPOSITION TEMPERATURES; EPITAXIAL RELATIONSHIPS; EPITAXIAL SRRUO3; OPTIMUM CONDITIONS; PREFERRED ORIENTATIONS; SI (001) SUBSTRATE; THIN-FILM ELECTRODE;

STRONTIUM COMPOUNDS;

EID: 62149112123     PISSN: 15989623     EISSN: None     Source Type: Journal    
DOI: 10.1007/s12540-009-0089-5     Document Type: Article

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