Au-pattern fabrication on a cellulose film using a polyurethane acrylate mold

Journal of Micromechanics and Microengineering

Volumn 19, Issue 3, 2009, Pages

  Han, Kwangjoon ^a   Kang, Kwang Sun ^a   Kim, Jaehwan ^a  

^a Inha University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CELLULOSE; CELLULOSE FILMS; FABRICATION; LITHOGRAPHY; MEMS; MICROELECTROMECHANICAL DEVICES; MOLDS; MONOLAYERS; PHOTORESISTS; PLASTIC FILMS; POLYMERS;

CONVENTIONAL LITHOGRAPHIES; CONVENTIONAL PHOTOLITHOGRAPHIES; ELECTRO-ACTIVE PAPERS; FLEXIBLE CHARACTERISTICS; GOLD LAYERS; GOLD SURFACES; LITHOGRAPHY PROCESS; MEMS DEVICES; MERCAPTOPROPYLTRIMETHOXYSILANE; MICRO-PATTERNING; PATTERN FABRICATIONS; POLYURETHANE ACRYLATES; SELF-ASSEMBLY MONOLAYERS; SMART MATERIALS; STAMPING PROCESS; SU 8 PHOTO RESISTS; TRANSFER PRINTINGS;

GOLD;

ASSEMBLY; CELLULOSE; CELLULOSE FILM; GOLD; LITHOGRAPHY; MOLDS; MONOLAYERS; PLASTIC FILMS; POLYMERS;

EID: 61849092038     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/19/3/035010     Document Type: Article

References (19)

1. Kim J, Yun S and Ounaies Z 2006 Discovery of cellulose as a smart material Macromolecules 39 4202-6
2. Kim J, Song C S and Yun S 2006 Cellulose based electro-active papers: performance and environmental effects Smart Mater. Struct. 15 719-23
3. Kim J, Bae S H and Lim H G 2006 Micro transfer printing on cellulose electro-active papers Smart Mater. Struct. 15 889-92
4. Xia Y and Whitesides G M 1998 Soft lithography Annu. Rev. Mater. Sci. 28 153-84
5. Xia Y and Whitesides G M 1998 Soft lithography Angew. Chem. Int. Ed. 37 550-75
6. Fuller S B, Wilhelm E J and Jacobson J M 2002 Ink-jet printed nanoparticle microelectromechanical systems J. Microelectromech. Syst. 11 54-60
7. Lim H G, Cho G Y, Kim J and Kang K S 2007 Au micro-pattern fabrication on cellulose paper: comparison of m-contact printing and liftoff techniques J. Micromech. Microeng. 17 1415-9
8. Choi S J, Yoo P J, Baek S J, Kim T W and Lee H H 2004 An ultraviolet-curable mold for sub-100 nm lithography J. Am. Chem. Soc. 126 7744-5
9. Roca-Cusacha P, Rico F, Martnez E, Toset J, Farr R and Navajas D 2005 Stability of microfabricated high aspect ratio structures in poly(dimethylsiloxane) Langmuir 21 5542-8
10. Zhang Y, Lo C W, Taylor A and Yang S 2006 Replica molding of high-aspect-ratio polymeric nanopillar arrays with high fidelity Langmuir 22 8595-601
11. Choi W M, Song M Y and Park O O 2006 Compressed-carbon dioxide assisted nanoimprint lithography using polymeric mold Microelectron. Eng. 83 1957-60
12. Odom T W, Love J C, Wolfe D B, Paul K E and Whitesides G M 2002 Improved pattern transfer in soft lithography using composite stamps Langmuir 18 5314-20
13. Suh K Y, Langer R and Lahann J 2003 Fabrication of elastomeric stamps with polymer-reinforced sidewalls via chemically selective vapor deposition polymerization of poly(p-xylylene) Appl. Phys. Lett. 83 4250-2
14. Park J W, Kim J K and Suh K Y 2006 Fabrication of zinc oxide nanostructures using solvent-assisted capillary lithography Nanotechnology 17 2631-5
15. Kim J K and Suh K Y 2008 On the role of surface tensions and process conditions in detachment nanolithography Appl. Phys. Lett. 92 223107
16. Suh K Y, Jeong H E, Kim D H, Singh R A and Yoon E S 2006 Capillarity-assisted fabrication of nanostructures using a less permeable mold for nanotribological applications Appl. Phys. Lett. 200 034303
17. Nayak J N, Chen Y and Kim J 2008 Removal of impurities from cellulose films after their regeneration from cellulose dissolved in DMAc/LiCl solvent system Ind. Eng. Chem. Res. 47 1702-6
18. Kumar A, Hiebuyck H A and Whitesides G M 1994 Patterning self-assembled monolayers: application in materials science Langmuir 10 1498-511
19. Choi I, Kim Y, Kang S K, Lee J and Yi J 2006 Phase separation of a mixed self-assembled monolayer prepared via a stepwise method Langmuir 22 4885-9