On the relationship between local voltage maxima and efficiency changes during galvanostatic Ti anodising

Electrochimica Acta

Volumn 54, Issue 12, 2009, Pages 3330-3338

  Vanhumbeeck, J F ^a   Ryelandt, L ^a   Proost, J ^a  

^a UNIVERSITÉ CATHOLIQUE DE LOUVAIN   (Belgium)

Author keywords

Anodising efficiency; Anodising ratio; High field ionic migration; TEM; TiO2

Indexed keywords

AMORPHOUS FILMS; FILM GROWTH; OXIDE MINERALS; RATE CONSTANTS; STRESS CORROSION CRACKING; TITANIUM DIOXIDE; TITANIUM OXIDES;

ANODISING EFFICIENCY; ANODISING RATIO; HIGH-FIELD IONIC MIGRATION; TEM; TIO2;

OXIDE FILMS;

EID: 61549143700     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2008.12.046     Document Type: Article

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