Optimized deposition and characterization of nanocrystalline magnesium indium oxide thin films for opto-electronic applications

Materials Research Bulletin

Volumn 44, Issue 5, 2009, Pages 1051-1057

  Raj, A Moses Ezhil ^a   Ravidhas, C ^b   Ravishankar, R ^c   Kumar, A Rathish ^c   Selvan, G ^e   Jayachandran, M ^c   Sanjeeviraja, C ^d  

^a SCOTT CHRISTIAN COLLEGE AUTONOMOUS   (India)

^b BISHOP HEBER COLLEGE   (India)

^c CENTRAL ELECTROCHEMICAL RESEARCH INSTITUTE   (India)

^d ALAGAPPA UNIVERSITY   (India)

^e THANTHAI HANS ROEVER COLLEGE   (India)

Author keywords

A. Thin films; B. Chemical synthesis; C. Atomic force microscopy; C. X ray diffraction; D. Electrical properties

Indexed keywords

ATOMIC FORCE MICROSCOPY; ATOMS; CARRIER CONCENTRATION; CHARGE TRANSFER; CONDUCTIVE FILMS; DIFFRACTION; ELECTRIC CONDUCTIVITY; ELECTRON MOBILITY; GALVANOMAGNETIC EFFECTS; GAS SENSING ELECTRODES; HALL MOBILITY; INDIUM; ION EXCHANGE; MAGNESIUM; MAGNESIUM PRINTING PLATES; METAL IONS; OPTOELECTRONIC DEVICES; OXIDE MINERALS; OXYGEN; OXYGEN VACANCIES; QUARTZ; SYNTHESIS (CHEMICAL); THIN FILMS; X RAY DIFFRACTION;

A. THIN FILMS; B. CHEMICAL SYNTHESIS; C. ATOMIC FORCE MICROSCOPY; C. X-RAY DIFFRACTION; D. ELECTRICAL PROPERTIES;

OXIDE FILMS;

EID: 61549134542     PISSN: 00255408     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.materresbull.2008.10.020     Document Type: Article

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