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Volumn 255, Issue 11, 2009, Pages 5729-5735

Uniform design and regression analysis of LPCVD boron carbide from BCl 3 -CH 4 -H 2 system

Author keywords

Boron carbide; CVD; Deposition mechanisms; Microstructure; Uniform design

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; BORON CARBIDE; BORON DEPOSITS; CHLORINE COMPOUNDS; DEPOSITION RATES; DESIGN; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; MICROSTRUCTURE; REGRESSION ANALYSIS; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

EID: 61449190638     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.12.075     Document Type: Article
Times cited : (23)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.