Uniform design and regression analysis of LPCVD boron carbide from BCl 3 -CH 4 -H 2 system

Applied Surface Science

Volumn 255, Issue 11, 2009, Pages 5729-5735

  Liu, Yongsheng ^a   Zhang, Litong ^a   Cheng, Laifei ^a   Zeng, Qingfeng ^a   Zhang, Weihua ^a   Yang, Wenbin ^a   Feng, Zude ^b   Li, Siwei ^b   Zeng, Bin ^b  

^a NORTHWESTERN POLYTECHNICAL UNIVERSITY   (China)

^b XIAMEN UNIVERSITY   (China)

Author keywords

Boron carbide; CVD; Deposition mechanisms; Microstructure; Uniform design

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; BORON CARBIDE; BORON DEPOSITS; CHLORINE COMPOUNDS; DEPOSITION RATES; DESIGN; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; MICROSTRUCTURE; REGRESSION ANALYSIS; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

AUGER-ELECTRON SPECTRA; DEPOSITION MECHANISM; DEPOSITION PARAMETERS; DEPOSITION TEMPERATURES; ENERGY DISPERSIVE SPECTRUM (EDS); RAMAN MICRO SPECTROSCOPY; UNIFORM DESIGN; UNIFORM DESIGN METHOD;

CHEMICAL VAPOR DEPOSITION;

EID: 61449190638     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.12.075     Document Type: Article

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