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Journal of Applied Physics

Volumn 105, Issue 4, 2009, Pages

Properties of GaAs(001) surfaces thermally annealed in vacuum

(2) Morota, Hiroaki a Adachi, Sadao a

a GUNMA UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; DEGRADATION; GALLIUM ALLOYS; OPTICAL MICROSCOPY; OZONE WATER TREATMENT; PASSIVATION; PHOTODEGRADATION; SEMICONDUCTING GALLIUM; SPECTROSCOPIC ELLIPSOMETRY; SPONTANEOUS EMISSION; X RAY PHOTOELECTRON SPECTROSCOPY;

AFM; ANNEALING TEMPERATURES; DAMAGED SURFACES; EX-SITU ATOMIC FORCE MICROSCOPIES; GAAS OXIDES; GAAS SURFACES; GAAS(001); IN VACUUMS; NATIVE OXIDE LAYERS; PASSIVATION FILMS; PL DEGRADATIONS; ROUGHENED SURFACES; TEMPERATURE RANGES; THERMAL DEGRADATIONS; THERMAL OXIDES; THERMAL-ANNEALING; X-RAY PHOTOELECTRON SPECTROSCOPIES; XPS DATUM;

SURFACE PROPERTIES;

EID: 61449129282 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3078178 Document Type: Article

Times cited : (14)

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