Paired circularly polarized heterodyne ellipsometer

Applied Optics

Volumn 48, Issue 4, 2009, Pages 758-764

  Yu, Chih Jen ^a   Lin, Chu En ^a   Yu, Li Ping ^b   Chou, Chien ^a,b,c  

^a NATIONAL CENTRAL UNIVERSITY   (Taiwan)

^b NATIONAL YANG MING UNIVERSITY   (Taiwan)

^c CHANG GUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CIRCULAR POLARIZATION; ELLIPSOMETRY; FILM THICKNESS; LASER BEAMS; SILICON OXIDES; THICKNESS MEASUREMENT;

CIRCULARLY POLARIZED; CIRCULARLY POLARIZED LASERS; DETECTION SENSITIVITY; ELLIPSOMETRIC PARAMETERS; HETERODYNE INTERFEROMETER; POLARIZATION MODULATION; PRECISE MEASUREMENTS; SILICON SUBSTRATES;

HETERODYNING;

SILICON DIOXIDE;

ARTICLE; ARTIFICIAL MEMBRANE; CHEMISTRY; EQUIPMENT; EQUIPMENT DESIGN; EVALUATION; INSTRUMENTATION; INTERFEROMETRY; MATERIALS TESTING; METHODOLOGY; NANOTECHNOLOGY; REFRACTOMETRY; REPRODUCIBILITY; SENSITIVITY AND SPECIFICITY;

EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; INTERFEROMETRY; MATERIALS TESTING; MEMBRANES, ARTIFICIAL; NANOTECHNOLOGY; REFRACTOMETRY; REPRODUCIBILITY OF RESULTS; SENSITIVITY AND SPECIFICITY; SILICON DIOXIDE;

EID: 61449106742     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.48.000758     Document Type: Conference Paper

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