HICS: Highly charged ion collisions with surfaces

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 267, Issue 4, 2009, Pages 687-690

  Peters, T ^a   Haake, C ^a   Hopster, J ^a   Sokolovsky, V ^a   Wucher, A ^a   Schleberger, M ^a  

^a UNIVERSITY OF DUISBURG ESSEN   (Germany)

Author keywords

AFM; Graphene; Highly charged ions; Sputtering

Indexed keywords

ATOMIC FORCE MICROSCOPY; ION SOURCES; METAL INSULATOR BOUNDARIES; XENON;

AFM; BEAM LINES; CHARGE SEPARATIONS; CHARGE STATE; ELECTRONIC EXCITATIONS; GRAPHENE; GRAPHENE LAYERS; HIGHLY CHARGED IONS; IMPACT VELOCITIES; IN-SITU; METAL INSULATOR METALS; NEW INSTRUMENTS; PARTICLE EMISSIONS; SCANNING PROBE MICROSCOPES; TARGET CHAMBERS; TIME-OF-FLIGHT SYSTEMS; ULTRA-HIGH VACUUMS;

IONS;

EID: 61349180706     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2008.11.024     Document Type: Article

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