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Volumn 255, Issue 10, 2009, Pages 5191-5198

Physical aspects of the pulsed laser deposition technique: The stoichiometric transfer of material from target to film

Author keywords

Ion bombardment; Laser plasma; PLD; Plume expansion; Pulsed laser deposition; Sputtering; Stoichiometry

Indexed keywords

ATOM LASERS; FILM GROWTH; ION BOMBARDMENT; LASER PRODUCED PLASMAS; LIGHT ABSORPTION; PLASMA INTERACTIONS; PULSED LASER DEPOSITION; SPUTTERING; STOICHIOMETRY;

EID: 61349164806     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.10.101     Document Type: Article
Times cited : (251)

References (80)
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    • Miller J.C., and Haglund R.F. (Eds), Academic Press, New York
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    • (1998) Experimental Methods in the Physical Sciences , vol.30 , pp. 573
    • Reichling, M.1
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    • Behrisch R., and Eckstein W. (Eds), Springer, Berlin-Heidelberg
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    • (2007) Sputtering by Particle Bombardment


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.