In situ monitoring during pulsed laser deposition of complex oxides using reflection high energy electron diffraction under high oxygen pressure

Applied Physics Letters

Volumn 70, Issue 14, 1997, Pages 1888-1890

  Rijnders, Guus J H M ^a   Koster, Gertjan ^a   Blank, Dave H A ^a   Rogalla, Horst ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; EPITAXIAL GROWTH; PULSED LASER APPLICATIONS; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SPUTTER DEPOSITION; STRONTIUM COMPOUNDS; SUPERCONDUCTING FILMS; YTTRIUM COMPOUNDS;

HETEROEPITAXIAL GROWTH; HOMOEPITAXIAL GROWTH; IN SITU MONITORING; PULSED LASER DEPOSITION;

OXIDE SUPERCONDUCTORS;

EID: 0031557645     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.118687     Document Type: Article

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