The shallow implantation of bismuth during the growth of bismuth nanocrystals in Al2O3 by pulsed laser deposition

Materials Research Society Symposium - Proceedings

Volumn 780, Issue , 2003, Pages 3-8

  Suarez Garcia A ^a   Barnes, J P ^b   Serna, R ^a   Petford Long, A K ^b   Afonso, C N ^a   Hole, D ^c  

^a INSTITUTO DE ÓPTICA   (Spain)

^b UNIVERSITY OF OXFORD   (United Kingdom)

^c UNIVERSITY OF SUSSEX   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; BISMUTH; ION IMPLANTATION; NANOSTRUCTURED MATERIALS; NUCLEATION; PULSED LASER DEPOSITION; TRANSMISSION ELECTRON MICROSCOPY;

LASER ENERGY DENSITY;

ALUMINA;

EID: 0344495480     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-780-y1.2     Document Type: Conference Paper

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