Structure and magnetic properties of hexagonal-close-packed Co films deposited by low energy sputtering

IEEE Transactions on Magnetics

Volumn 35, Issue 5 PART 1, 1999, Pages 3019-3021

  Ishiiand, K ^a,b   Naka, T ^a,b   Ohba, T ^a,b   Ishii, K ^a,b  

^a UTSUNOMIYA UNIVERSITY   (Japan)

^b TEIKYO UNIVERSITY   (Japan)

Author keywords

Co film; Gas flow sputtering; Heiagonal close packed co film; Sputtered film

Indexed keywords

COBALT; CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; ELECTRON MICROSCOPY; FILM GROWTH; KINETIC ENERGY; MAGNETIC ANISOTROPY; METALLIC FILMS; SPUTTER DEPOSITION; THERMAL EFFECTS; X RAY CRYSTALLOGRAPHY;

FACE CENTERED CUBIC (FCC) STRUCTURE; GAS FLOW SPUTTERING; HEXAGONAL CLOSE PACKED (HCP) LATTICE;

MAGNETIC THIN FILMS;

EID: 0033183965     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/20.801071     Document Type: Article

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