TEM analysis of Hcp-Co films deposited by gas flow sputtering

IEEJ Transactions on Electrical and Electronic Engineering

Volumn 3, Issue 4, 2008, Pages 375-378

  Sakuma, Hiroshi ^a   Tai, Hayato ^a   Ishii, Kiyoshi ^a  

^a UTSUNOMIYA UNIVERSITY   (Japan)

Author keywords

Cobalt thin film; Crystal structure; fcc, Tem; Hep

Indexed keywords

AERODYNAMICS; CHEMICAL VAPOR DEPOSITION; CRYSTAL STRUCTURE; DIFFRACTION; FLOW OF GASES; GAS DYNAMICS; MAGNETRON SPUTTERING; METALLIC FILMS; STACKING FAULTS; THICK FILMS; X RAY ANALYSIS;

CO FILMS; CO THIN FILMS; ELECTRICAL ENGINEERS; FEE STRUCTURE; GAS FLOW SPUTTERING; LATTICE (CO); LATTICE IMAGING; LOW ENERGIES; RF MAGNETRON SPUTTERING; X RAY DIFFRACTION (XRD);

COBALT;

EID: 46949108323     PISSN: 19314973     EISSN: 19314981     Source Type: Journal    
DOI: 10.1002/tee.20285     Document Type: Conference Paper

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