Preparation of transparent conducting B-doped ZnO films by vacuum arc plasma evaporation

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 25, Issue 4, 2007, Pages 1193-1197

  Miyata, Toshihiro ^a   Honma, Yasunori ^a   Minami, Tadatsugu ^a  

^a KANAZAWA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BORON COMPOUNDS; DOPING (ADDITIVES); PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SUBSTRATES; THIN FILMS;

DEPOSITION RATE; THIN FILM RESISTIVITY; VISIBLE WAVELENGTH;

ZINC OXIDE;

EID: 34547335721     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2484424     Document Type: Article

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