An improvement of Stillinger-Weber interatomic potential model for reactive ion etching simulations

Japanese Journal of Applied Physics

Volumn 48, Issue 2, 2009, Pages

  Ohta, Hiroaki ^a,b   Nagaoka, Tatsuya ^a   Eriguchi, Koji ^a   Ono, Kouichi ^a  

^a KYOTO UNIVERSITY   (Japan)

^b University of California   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPIC ETCHING; DYNAMICS; MODEL STRUCTURES; MOLECULAR DYNAMICS; REACTION KINETICS; SURFACE REACTIONS; SURFACE STRUCTURE;

HALOGEN ATOMS; HIGH ENERGIES; IMPROVED MODELS; INTERATOMIC POTENTIAL MODELS; MOLECULAR DYNAMICS SIMULATIONS; ORIGINAL MODELS; PENETRATION ENERGIES; REACTIVE IONS; REPULSIVE INTERACTIONS; THREE-BODY POTENTIALS;

REACTIVE ION ETCHING;

EID: 60849137230     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.48.020225     Document Type: Article

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