SCOPUS 정보 검색 플랫폼

International Conference on Solid-State and Integrated Circuits Technology Proceedings, ICSICT

Volumn , Issue , 2008, Pages 1252-1255

Interface engineering for high-k/Ge gate stack

(2) Xie, Ruilong a Zhu, Chunxiang a

a NATIONAL UNIVERSITY OF SINGAPORE (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ADVANCED CMOS DEVICES; GATE STACKS; HIGH-K GATE STACK FORMATIONS; INTERFACE ENGINEERING TECHNIQUES; INTERFACE ENGINEERINGS; INTERFACE QUALITIES; SURFACE PASSIVATIONS;

GATE DIELECTRICS; GATES (TRANSISTOR); GERMANIUM; INTEGRATED CIRCUITS; PASSIVATION;

LOGIC GATES;

EID: 60649108278 PISSN: None EISSN: None Source Type: Conference Proceeding
DOI: 10.1109/ICSICT.2008.4734778 Document Type: Conference Paper

Times cited : (3)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.