Multiwalled carbon nanotube deposition profiles within a CVD reactor: An experimental study

Chemical Engineering Science

Volumn 64, Issue 7, 2009, Pages 1503-1510

  Kunadian, Illayathambi ^a   Andrews, Rodney ^a,b   Pinar Menguc M ^c   Qian, Dali ^a  

^a UNIVERSITY OF KENTUCKY   (United States)

^b Department of Chemical Engineering ^*  (United States)

^c UNIVERSITY OF KENTUCKY   (United States)

Author keywords

Chemical vapor deposition; Deposition rates; Multiwalled carbon nanotubes; Process parameters

Indexed keywords

AERODYNAMICS; CARBON NANOTUBES; DEPOSITION; FLOW OF GASES; FLOW RATE; MULTIWALLED CARBON NANOTUBES (MWCN); REACTION RATES; SUBSTRATES; VAPORS;

CARBON NANOTUBE ARRAYS; CARRIER GAS FLOW RATES; CATALYTIC-CVD; CHEMICAL VAPOR DEPOSITION REACTORS; CVD REACTORS; DEPOSITION PATTERNS; DEPOSITION PROFILES; ELECTRONIC DEVICES; EXPERIMENTAL STUDIES; FEED GAS FLOWS; FEED MATERIALS; FEED RATES; FURNACE TEMPERATURES; GAP DISTANCES; MULTI-WALLED; NANOTUBE DEPOSITIONS; PROCESS PARAMETERS; REACTION TEMPERATURES; REACTOR GEOMETRIES; UNIFORM DEPOSITIONS; WELL-ALIGNED;

CHEMICAL VAPOR DEPOSITION;

EID: 60549104195     PISSN: 00092509     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ces.2008.12.033     Document Type: Article

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