Investigation of microstructure evolution in Pt-doped TiO2 thin films deposited by rf magnetron sputtering

Physica B: Condensed Matter

Volumn 403, Issue 17, 2008, Pages 2698-2701

  Wenbin, Xu ^a   Shurong, Dong ^a   Demiao, Wang ^a   Gaochao, Ren ^a  

^a ZHEJIANG UNIVERSITY   (China)

Author keywords

Raman spectra; Sputtering; Thin film structure; XRD

Indexed keywords

ANNEALING; DOPING (ADDITIVES); ELECTRODEPOSITION; MAGNETRON SPUTTERING; MAGNETRONS; METALLIC GLASS; RAMAN SCATTERING; RAMAN SPECTROSCOPY; THIN FILM DEVICES; THIN FILMS; TITANIUM; TITANIUM DIOXIDE; TITANIUM OXIDES; X RAY ANALYSIS; X RAY DIFFRACTION ANALYSIS;

BOMBARDMENT ENERGIES; DOPING LEVELS; GRAIN SIZES; MICROSTRUCTURE EVOLUTIONS; NUCLEATION SITES; OPTICAL TRANSPARENCIES; RAMAN SPECTRA; RF- MAGNETRON SPUTTERING; RF-POWER; SPUTTERING; SPUTTERING PARAMETERS; SPUTTERING PRESSURES; STRUCTURAL VARIATIONS; SUBSTRATE TEMPERATURES; THERMAL STABILITIES; THERMAL-ANNEALING; THIN FILM STRUCTURE; TITANIA; X- RAY DIFFRACTIONS; XRD;

PLATINUM;

EID: 60049092962     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physb.2008.01.048     Document Type: Article

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