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Applied Organometallic Chemistry

Volumn 23, Issue 2, 2009, Pages 62-67

Atmospheric pressure deposition of F-doped SnO2 thin films from organotln fluoroalkoxide precursors

(2) Molloy, Kleran C a Stanley, Joanne E a

a University of Bath (United Kingdom)

Author keywords

CVD; Fluoroalkoxide; Tin oxide

Indexed keywords

ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; FLUORINE; HARD COATINGS; TIN; TITANIUM COMPOUNDS;

CVD; FLUOROALKOXIDE; FLUOROALKOXIDES; PREFERRED ORIENTATIONS; TIN OXIDE; TRIBUTYLTIN;

ORGANIC POLYMERS;

EID: 59849089643 PISSN: 02682605 EISSN: 10990739 Source Type: Journal
DOI: 10.1002/aoc.1472 Document Type: Article

Times cited : (12)

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