Atmospheric pressure deposition of fluorine-doped SnO2 thin films from organotin fluorocarboxylate precursors

Applied Organometallic Chemistry

Volumn 19, Issue 5, 2005, Pages 658-671

  Mahon, Mary F ^a   Molloy, Kieran C ^a   Stanley, Joanne E ^a   Rankin, David W H ^b   Robertson, Heather E ^b   Johnston, Blair F ^b  

^a University of Bath Claverton Down   (United Kingdom)

^b UNIVERSITY OF EDINBURGH   (United Kingdom)

Author keywords

CVD; Electron diffraction; Fluorocarboxylate; Tin oxide; X ray structure

Indexed keywords

ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; DOPING (ADDITIVES); ELECTROCHROMIC DEVICES; ELECTRON DIFFRACTION; FLUORESCENCE; FLUORINE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; SYNTHESIS (CHEMICAL); TIN COMPOUNDS; X RAY ANALYSIS;

FLUOROCARBOXYLATE; GAS-PHASE ELECTRON DIFFRACTION; TIN OXIDES; X RAY STRUCTURE;

THIN FILMS;

EID: 17544384077     PISSN: 02682605     EISSN: None     Source Type: Journal    
DOI: 10.1002/aoc.722     Document Type: Article

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