Fluorinated organotins as precursors of F-doped tin dioxide

Main Group Metal Chemistry

Volumn 25, Issue 1-2, 2002, Pages 59-65

  Boutet, S ^a   Gamard, A ^a   Jousseaume, B ^a   Toupance, T ^a   Campet, G ^a   Cachet, H ^a  

^a UNIVERSITÉ DE BORDEAUX   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ALKOXYFLUOROBIS(BETA DIKETONATO)TIN; CARBON; CHEMICAL COMPOUND; DIFLUOROBIS(BETA DIKETONATO)TIN; FLUORINE; ORGANOTIN COMPOUND; OXIDE; SOL GEL; TIN DIOXIDE; TRIALKYNYL(FLUOROORGANO)TIN; UNCLASSIFIED DRUG;

ARTICLE; CHEMICAL PARAMETERS; CHEMICAL REACTION; CRYSTAL STRUCTURE; FILM; FLUORINATION; HYDROLYSIS; POROSITY; POWDER; SYNTHESIS; TEMPERATURE;

EID: 0036399797     PISSN: 07921241     EISSN: 21910219     Source Type: Journal    
DOI: 10.1515/MGMC.2002.25.1-2.59     Document Type: Article

References (34)

1. D.S. Ginley, C. Bright, MRS Bulletin, 2000, 25,15.
2. R.G. Gordon, MRS Bulletin, 2000, 25,52.
3. a) N. Sonoda, W. Shimotsuma, S. Tsubusaki, U.S. Patent, 4246143, 1981.
4. b) J. Robert, U.S. Patent, 5494652, 1996.
5. C. Geoffroy, G. Campet, F. Menil, J. Portier, J. Salardenne, G. Couturier, Active and Passive Elec. Comp., 1991, 14,111.
6. T. Maruyama, K. Tabata, J. Appl. Phys., 1990, 68, 4282.
7. T. Ishida, O. Tabata, J. Park, S.O. Shin, H. Magara, S. Tamura, S. Mochizuki, T. Mihara, Thin Solid Films, 1996, 281-282, 228.
8. S. Suh, D.M. Hoffmann, L.M. Atagi, D.C. Smith, J-R. Liu, W-K. Chu, Chem. Mater., 1997, 9, 730.
9. S. Suh, Z. Zhang, W-K. Chu, D.M. Hoffman, Thin Solid Films, 1999, 345, 240.
10. D.R. Acosta, E.P. Zironi, E. Montoya, W. Estrada, Thin Solid Films, 1996, 288, 1.
11. A. Messad, J. Bruneaux, H. Cachet, M. Froment, J. Mater. Sci., 1996, 29, 1251.
12. G.C. Morris, A.E. Mc Elnea, Appl. Surf. Sci., 1996, 92, 167.
13. J. Dutta, P. Roubeau, T. Emeraud, J-M. Laurent, A. Smith, F. Leblanc, J. Perrin, Thin Solid Films, 1994, 239, 150.
14. K. Tsukuma, T. Akiyama, H. Imai, J. Non-Cryst. Solids, 1997, 210, 48.
15. H. Dislich, E. Hussmann, Thin Solid Films, 1981, 77, 129.
16. C.J. Brinker, G.W. Scherer, Sol-Gel Science, Academic Press: San Diego (1990).
17. M.A. Aegerter, A. Reich, D. Ganz, G. Gasparro, J. Pütz, T. Krajewski, J. Non-Cryst. Solids, 1997, 218, 123.
18. C. Goebbert, M.A. Aegerter, D. Burgard, R. Nass, H. Schmidt, J. Mater. Chem., 1999, 9, 253.
19. J.P. Chatelon, C. Terrier, E. Bernstein, R. Berjoan, J.A. Roger, Thin Solid Films, 1994, 247, 162.
20. Y. Takahashi, Y. Wada, J. Electrochem. Soc., 1997, 137, 267.
21. P. Olivi, E.C. Pereira, E. Longo, J.A. Varella, L.O.S. Bulhoes, J. Electrochem. Soc., 1993, 140, L81.
22. S.C. Ray, M.K. Karanjai, D. DasGupta, Surf. Coatings Technol., 1998, 102, 73.
23. A. Gamard, B. Jousseaume, T. Toupance, G. Campet, Inorg. Chem., 1999, 38, 4671.
24. P. Jaumier, B. Jousseaume, M. Lahcini, F. Ribot, C. Sanchez, J. Chem. Soc. Chem. Comm., 1998, 369.
25. C. Franc, B. Jousseaume, M. Linker, T. Toupance, Chem. Mater., 2000, 12, 3100.
26. A. Gamard, O. Babot, B. Jousseaume, M-C. Rascle, T. Toupance, G. Campet, Chem. Mater., 2000, 12, 3419.
27. H. Cachet, A. Gamard, G. Campet, B. Jousseaume, T. Toupance, Thin Solid Films, 2001, 388, 41.
28. R.W. Jones, R. Fay, Inorg. Chem., 1973, 11, 2599.
29. R. Di Maggio, R. Campostrim, G. Guella, Chem. Mater., 1998, 10, 3839.
30. See J.P. Eberhardt, Structural and Chemical Analysis of Materials; John Wiley & Sons: New York, 1991; p. 203.
31. J. Proscia, R.G. Gordon, Thin Solid Films, 1992, 214, 175.
32. A. Gamard, H. Cachet, unpublished results.
33. C. Cachet, H. Cachet, B. Jousseaume, T. Toupance, V. Vivier, Electrochim. Acta, submitted.
34. H. Cachet, C. Cachet, G. Folcher, T. Toupance, 198th Meeting of the Electrochemical Society, Phoenix, USA, Oct. 23-25, Book of abstracts, abstr, no. (2000) 977.