Porous carbon film electrodes prepared by pulsed discharge plasma CVD

Diamond and Related Materials

Volumn 18, Issue 2-3, 2009, Pages 426-428

  Noda, Mikio ^a   Yukawa, Hiroyuki ^a   Matsushima, Masahiro ^a   Uchida, Hideo ^a   Umeno, Masayoshi ^a  

^a CHUBU UNIVERSITY   (Japan)

Author keywords

EDLC; Plasma CVD; Porous carbon electrode; Pulsed discharge

Indexed keywords

CARBON FILMS; CHEMICAL VAPOR DEPOSITION; COBALT; COMPOSITE FILMS; DIAMOND FILMS; DIAMOND LIKE CARBON FILMS; ELECTRODEPOSITION; ELECTRODES; GRAPHITE; PLASMA DEPOSITION; PLASMA DIAGNOSTICS; PLASMAS; SUBSTRATES; TRANSITION METALS; TRANSMISSION ELECTRON MICROSCOPY;

CHEMICAL VAPOUR DEPOSITIONS; DEPOSITION TIME; DUTY RATIOS; EDLC; FIBROUS STRUCTURES; GRAPHITE-LIKE STRUCTURES; HIGH RESOLUTIONS; PLASMA CVD; POROUS CARBON ELECTRODE; POROUS CARBONS; POROUS STRUCTURES; PULSE VOLTAGES; PULSED DISCHARGE; PULSED DISCHARGE PLASMAS; RAMAN SPECTRUM; SEM; SMALL GRAINS; SUBSTRATE SURFACES; SUBSTRATE TEMPERATURES; TEM; TOTAL PRESSURES; TRANSMISSION ELECTRONS;

ELECTRIC DISCHARGES;

EID: 59649120544     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2008.10.029     Document Type: Article

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