Formation of diamond films by pulsed discharge plasma chemical vapor deposition

Journal of the Indian Institute of Science

Volumn 81, Issue 6, 2001, Pages 627-636

  Noda, Mikio ^a  

^a AICHI UNIVERSITY OF EDUCATION   (Japan)

Author keywords

Diamond film; Field emission; Plasma CVD; Plasma emission spectroscopy; Pulsed discharge

Indexed keywords

CRYSTAL STRUCTURE; CURRENT VOLTAGE CHARACTERISTICS; DIAMOND FILMS; ELECTRIC DISCHARGES; EMISSION SPECTROSCOPY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY;

CRYSTALLINE QUALITY; PLASMA EMISSION SPECTROSCOPY; PULSED DISCHARGE PLASMA CHEMICAL VAPOR DEPOSITION;

FILM PREPARATION;

EID: 0042320489     PISSN: 09704140     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (14)

1. Nakao, S., Maruno, S., Noda, M., Kusakabe, H. and Shimizu, H. J. Cryst. Growth, 1990, 99, 1215.
2. Nakao, S., Noda, M., Kusakabe, H., Shimizu, H. and Maruno, S. Jap. J. Appl. Phys., 1990, 29, 1511.
3. Nakao, S., Watatani, H., Maruno, S. and Noda, M. J. Cryst. Growth, 1991, 115, 313.
4. Nakao, S., Noda, M., Watatani, H. and Maruno, S. Jap. J. Appl. Phys., 1991, L30, 45.
5. Noda, M., Kusakabe, H., Taniguchi, K. and Maruno, S. Jap. J. Appl. Phys., 1994, 33, 4400.
6. Araki, T., Noda, M. and Katsuyama, T. Mater. Sci. Engng B, 1997, 48, 221.
7. Noda, M., Kusakabe, H. and Maruno S. Proc. 4th Int. Conf. New Diamond Science and Technology, 1994, MYU, Tokyo, p. 73.
8. Noda, M. Proc. 2nd Int. Symp. Microstructures and Mechanical Properties of New Engineering, Materials, Beijing, 1995, International Academic Publishers, Beijing, p. 303.
9. Noda, M. Oyo Buturi, 1996, 65, 1258 (in Japanese).
10. Noda, M. and Araki, T. Proc. 4th Special Symp. Advanced Materials, Nagoya, 1998, The Co-op Printing Bureau of Nagoya Univ., p. 287.
11. Noda, M. Jap J. Appl. Phys., 1999, 38, 4496.
12. Spear, K. E. and Frenklach, M. Synthetic diamond (K. E. Spear and J. P. Dismukes, eds), 1994, Ch. 8, p. 243, Wiley.
13. Kondo, R., Noda, M., Urano, M., Tanemura, M. and Okuyama, F. Annual Meeting of Applied Physics of Japan, 1996, 28-p-E-9.
14. Urano, M., Tanemura, M., Okuyama, F., Kondo, R. and Noda, M. Annual Meeting of Applied Physics of Japan, 1996, 28-p-E-10.