Direct preparation of crystalline CuInS2 thin films by radiofrequency sputtering

Materials Science and Engineering: B

Volumn 157, Issue 1-3, 2009, Pages 66-71

  Cayzac, R ^a   Boulc'h, F ^a   Bendahan, M ^b   Lauque, P ^b   Knauth, P ^a  

^a AIX MARSEILLE UNIVERSITY   (France)

^b AIX MARSEILLE UNIVERSITÉ   (France)

Author keywords

Atomic force microscopy; Chalcogenides; Grazing incidence X ray diffraction; Sputtering; Thin films

Indexed keywords

AMORPHOUS FILMS; ATOMIC FORCE MICROSCOPY; CONDUCTIVE FILMS; COPPER COMPOUNDS; CRYSTALLINE MATERIALS; DEPOSITION RATES; FILM PREPARATION; INDIUM COMPOUNDS; INORGANIC COMPOUNDS; ORGANOMETALLICS; SCANNING ELECTRON MICROSCOPY; SPUTTERING; SULFUR COMPOUNDS; X RAY DIFFRACTION;

ATOMIC-FORCE-MICROSCOPY; DIRECT PREPARATION; GRAZING INCIDENCE X-RAY DIFFRACTION; GRAZING-INCIDENCE X-RAY DIFFRACTION; R.F. SPUTTERING; RADIO FREQUENCY SPUTTERING; RF-SPUTTERING; SPUTTERING; THIN-FILMS; TOXIC GAS;

THIN FILMS;

EID: 59649106990     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2008.12.018     Document Type: Article

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