SCOPUS 정보 검색 플랫폼

Thin Solid Films

Volumn 281-282, Issue 1-2, 1996, Pages 372-374

Fabrication and characterization of CuIn(SxSe1 - x)2 thin films deposited by r.f. sputtering

(5) Yamamoto, Yukio a Yamaguchi, Toshiyuki b Demizu, Yasutaka c Tanaka, Tooru c Yoshida, Akira c

a FUKUI NATIONAL COLLEGE OF TECHNOLOGY (Japan)

b WAKAYAMA NATIONAL COLLEGE OF TECHNOLOGY (Japan)

c TOYOHASHI UNIVERSITY OF TECHNOLOGY (Japan)

Author keywords

CuIn(SxSe1 x)2

Indexed keywords

CHARACTERIZATION; COPPER COMPOUNDS; CRYSTAL ORIENTATION; CRYSTAL STRUCTURE; FABRICATION; FILM PREPARATION; GRAIN SIZE AND SHAPE; LATTICE CONSTANTS; OPTICAL VARIABLES MEASUREMENT; SCANNING ELECTRON MICROSCOPY; SPUTTER DEPOSITION; X RAY DIFFRACTION ANALYSIS;

OPTICAL TRANSMITTANCE MEASUREMENTS; POWDER TARGETS; RADIOFREQUENCY SPUTTERING; SINGLE PHASE CHALCOPYRITE STRUCTURE;

THIN FILMS;

EID: 0030217691 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/0040-6090(96)08625-7 Document Type: Article

Times cited : (49)

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