Structural, optical and electrical properties of nanodiamond films deposited by HFCVD on borosilicate glass, fused silica and silicon at low temperature

Physica Status Solidi (A) Applied Research

Volumn 201, Issue 11, 2004, Pages 2499-2502

  Remes, Z ^a,b,c   Avigal, Y ^a   Kalish, R ^a   Uzan Saguy, C ^a   Chack, A ^a   Nesladek M ^c  

^a TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

^b INSTITUTE OF PHYSICS   (Czech Republic)

^c Building D   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; BOROSILICATE GLASS; CHEMICAL VAPOR DEPOSITION; FUSED SILICA; OPTICAL PROPERTIES; POLYCRYSTALLINE MATERIALS; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SECONDARY ION MASS SPECTROMETRY; SIGNAL INTERFERENCE; ULTRAVIOLET RADIATION; X RAY DIFFRACTION ANALYSIS;

ELECTRICAL PROPERTIES; HOT FILAMENT ASSISTED CHEMICAL VAPOR DEPOSITION (HFCVD); INTERFERENCE FRINGES;

DIAMOND FILMS;

EID: 5444256230     PISSN: 00318965     EISSN: None     Source Type: Journal    
DOI: 10.1002/pssa.200405174     Document Type: Conference Paper

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