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Japanese Journal of Applied Physics

Volumn 47, Issue 12, 2008, Pages 8917-8920

Thermally stable Ag thin films modified with very thin Al oxide layers

(4) Kawamura, Midori a Inami, Yuuki a Abe, Yoshio a Sasaki, Katsutaka a

a KITAMI INSTITUTE OF TECHNOLOGY (Japan)

Author keywords

Ag thin film; Agglomeration suppression; Al oxide layer; Electrode; Modification; Resistivity

Indexed keywords

AGGLOMERATION; ALLOYING; ALUMINUM; ELECTRIC RESISTANCE; ELECTROCHEMICAL ELECTRODES; FILM PREPARATION; METALLIC FILMS; MULTILAYER FILMS; MULTILAYERS; OXIDE FILMS; POLARIZATION; SILVER ALLOYS; SOLIDS; THERMODYNAMIC STABILITY; THIN FILM DEVICES; THIN FILMS;

AG THIN FILM; AGGLOMERATION SUPPRESSION; AL OXIDE LAYER; ELECTRODE; MODIFICATION; RESISTIVITY;

SILVER;

EID: 59349113656 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.47.8917 Document Type: Article

Times cited : (21)

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