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Volumn 16, Issue 1, 2009, Pages 11-14

Efficient generation of cold atoms towards a source for atom lithography

(4) Ohmukai, Ryuzo c Hyodo, Masaharu a Watanabe, Masayoshi b Kondo, Hitoshi c

a NATIONAL INSTITUTE OF INFORMATION AND COMMUNICATIONS TECHNOLOGY (Japan)

b UNIVERSITY OF ELECTRO COMMUNICATIONS (Japan)

c SAITAMA UNIVERSITY (Japan)

Author keywords

Atom lithography; Atom source; Laser cooling; Magneto optical trap; Rubidium

Indexed keywords

EID: 59249100645 PISSN: 13406000 EISSN: 13499432 Source Type: Journal
DOI: 10.1007/s10043-009-0003-x Document Type: Article

Times cited : (1)

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