Realization and simulation of high-aspect-ratio micro/nanostructures by proton beam writing

Japanese Journal of Applied Physics

Volumn 47, Issue 11, 2008, Pages 8600-8605

  Valamontes, Evangelos ^a,b   Chatzichristidi, Margarita ^c   Tsikrikas, Nikolaos ^c   Goustouridis, Dimitrios ^c   Raptis, Ioannis ^c   Potiriadis, Constantinos ^d   Van Kan, Jeroen Anton ^e   Watt, Frank ^e  

^a UNIVERSITY OF PELOPONNESE   (Greece)

^b TEl of Athens ^*  (Greece)

^c INSTITUTE OF MICROELECTRONICS   (Greece)

^d GREEK ATOMIC ENERGY COMMISSION   (Greece)

^e NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

High aspect ratio; Lithography; Proton beam writing; Resist stripping

Indexed keywords

ION BEAM LITHOGRAPHY; PARTICLE BEAMS; PHOTORESISTORS; PHOTORESISTS; PRESSURE DROP; PROTON BEAMS; PROTONS; STRIPPING (DYES);

BEAM DIAMETERS; FINE STRUCTURES; HIGH-ASPECT-RATIO; LITHOGRAPHY; MASK-LESS PATTERNING; NANO SCALING; PROTON BEAM WRITING; RATIO STRUCTURES; RESIST FILMS; RESIST STRIPPING; SIMULATION RESULTS;

ASPECT RATIO;

EID: 58749090020     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.47.8600     Document Type: Article

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