Electron beam lithography simulation on homogeneous and multilayer substrates

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 2 A, 2000, Pages 635-644

  Raptis, Ioannis ^a   Nowotny, Bernhard ^b   Glezos, Nikos ^a   Gentili, Massimo ^c   Meneghini, Giancarlo ^d  

^a INSTITUTE OF NANOSCIENCE AND NANOTECHNOLOGY   (Greece)

^b Sigma C GmbH   (Germany)

^c CNR   (Italy)

^d CSELT   (Italy)

Author keywords

Boltzmann transport equation; Electron beam lithography; Lithography simulation; Proximity effect correction

Indexed keywords

BACKSCATTERING; COMPUTER SIMULATION; COMPUTER SOFTWARE; ELECTRON ENERGY LEVELS; ELECTRON SCATTERING; MATHEMATICAL MODELS; MULTILAYERS;

BOLTZMANN TRANSPORT EQUATION; ELECTRON BEAM PATTERNING; PROXIMITY EFFECT;

ELECTRON BEAM LITHOGRAPHY;

EID: 0033891105     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.635     Document Type: Article

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