Plasma-assisted deposition of lithium phosphorus oxynitride films: Substrate bias effects

Journal of Power Sources

Volumn 187, Issue 2, 2009, Pages 591-598

  Kim, Yoon Gu ^a   Wadley, H N G ^a  

^a University of Virginia   (United States)

Author keywords

Hollow cathode plasma; Lithium phosphorus oxynitride (Lipon); Plasma assisted directed vapor deposition (PA DVD); Substrate bias

Indexed keywords

ARGON; DATA STORAGE EQUIPMENT; HELIUM; INERT GASES; LITHIUM; LITHIUM COMPOUNDS; NITRIDES; NONMETALS; PHOSPHORUS; PLASMA DEPOSITION; PLASMAS; SUBSTRATES; SYNTHESIS (CHEMICAL); VAPORS; VIDEODISKS;

ARGON PLASMAS; CRYSTALLINITY; HELIUM GAS; HOLLOW CATHODE PLASMA; ION CONDUCTIVITIES; LITHIUM PHOSPHORUS OXYNITRIDE (LIPON); LITHIUM PHOSPHORUS OXYNITRIDE FILMS; LOCAL REGIONS; PLASMA ASSISTED DEPOSITION; PLASMA-ASSISTED DIRECTED VAPOR DEPOSITION (PA-DVD); SMOOTH SURFACES; SUBSTRATE BIAS; SUBSTRATE BIAS EFFECTS;

AMORPHOUS FILMS;

EID: 58649098526     PISSN: 03787753     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jpowsour.2008.11.070     Document Type: Article

References (36)

1. Jones S.D., and Akridge J.R. J. Power Sources 54 (1995) 63-67
2. Tarascon J.M., and Armand M. Nature 414 (2001) 359-367
3. Jin S.W., and Wadley H.N.G. J. Vacuum Sci. Technol. A: Vacuum, Surf. Films 26 (2008) 114-122
4. Dudney N.J., Bates J.B., Zuhr R.A., Young S., Robertson J.D., Jun H.P., and Hackney S.A. J. Electrochem. Soc. 146 (1999) 2455-2464
5. Linden D., and Reddy T.B. Handbook of Batteries (2002), McGraw-Hill, New York
6. Bruce P.G. Solid State Electrochemistry (1997), Cambridge University Press
7. Bates J.B., Dudney N.J., Gruzalski G.R., Zuhr R.A., Choudhury A., Luck C.F., and Robertson J.D. Solid State Ionics 53-56 (1992) 647-654
8. Dudney N.J., Bates J.B., and Robertson J.D. J. Vacuum Sci. Technol. A: Vacuum, Surf. Films 11 (1993) 377-389
9. Yu X., Bates J.B., Jellison J.G.E., and Hart F.X. J. Electrochem. Soc. 144 (1997) 524-532
10. Hamon Y., Douard A., Sabary F., Marcel C., Vinatier P., Pecquenard B., and Levasseur A. Solid State Ionics 177 (2006) 257-261
11. Zhao S., Fu Z., and Qin Q. Thin Solid Films 415 (2002) 108-113
12. Liu W.-Y., Fu Z.-W., Li C.-L., and Qin Q.-Z. Electrochem. Solid-State Lett. 7 (2004) J36-J40
13. Vereda F., Goldner R.B., Haas T.E., and Zerigian P. Electrochem. Solid-State Lett. 5 (2002) A239-A241
14. Kim Y.G., and Wadley H.N.G. J. Vacuum Sci. Technol. A: Vacuum, Surf. Films 26 (2008) 174-183
15. J.F. Groves, Ph.D. Dissertation, University of Virginia, Charlottesville, 1998.
16. Y.G. Kim, H.N.G. Wadley, Solid State Ionics (submitted for publication).
17. Lieberman M.A., and Lichtenberg A.J. Principles of Plasma Discharges and Materials Processing (1994), John Wiley & Sons Inc.
18. Mattox D.M. Electrochem. Technol. 2 (1964) 295
19. Mattox D.M. Handbook of Physical Vapor Deposition (PVD) Processing (1998), William Andrew Publishing/Moyes Publications
20. Zywitzki O., Goedicke K., and Morgner H. Surf. Coat. Technol. 151-152 (2002) 14-20
21. Morgner H., Neumann M., Straach S., and Krug M. Surf. Coat. Technol. 108-109 (1998) 513-519
22. Schiller S., Kirchhoff V., Schiller N., and Morgner H. Surf. Coat. Technol. 125 (2000) 354-360
23. Schiller S., Metzner C., and Zywitzki O. Surf. Coat. Technol. 125 (2000) 240-245
24. Ohring M. Materials Science of Thin Films: Deposition and Structure (2002), Academic Press, San Diega, CA
25. D.D. Hass, Ph.D. Dissertation, University of Virginia, Charlottesville, 2000.
26. Quan J.J., Zhou X.W., and Wadley H.N.G. Surf. Sci. 600 (2006) 4537-4547
27. Stuart R.V., and Wehner G.K. J. Appl. Phys. 33 (1962) 2345-2352
28. Sigmund P. Spttering by Particle Bombardment. I. Physical Sputtering of Single Element Solids (1981), Springer, New York
29. Harper J.M.E., Cuomo J.J., Gambino R.J., and Kaufman H.R. Nucl. Instrum. Methods Phys. Res. B: Beam Interact. Mater. Atoms 7-8 (1985) 886-892
30. Choi C.H., Cho W.I., Cho B.W., Kim H.S., Yoon Y.S., and Tak Y.S. Electrochem. Solid-State Lett. 5 (2002) A14-A17
31. Dudney N.J., and Jenson M.L. Properties of Vacuum Deposited Thin Films of Lithium Phosphorus Oxynitride (Lipon) with an Expanded Composition Range (2003), Oak Ridge National Laboratory, Oak Ridge
32. Martin P.J., Netterfield R.P., and Sainty W.G. J. Appl. Phys. 55 (1984) 235-241
33. Wang B., Chakoumakos B.C., Sales B.C., Kwak B.S., and Bates J.B. J. Solid State Chem. 115 (1995) 313-323
34. Park H., Nam S., Lim Y., Choi K., Lee K., Park G., Lee S.-R., Kim H., and Cho S. J. Electroceram. 17 (2006) 1023-1030
35. Mattox D.M. J. Vacuum Sci. Technol. 10 (1973) 47-52
36. Mattox D.M., and Kominiak G.J. J. Vacuum Sci. Technol. 9 (1972) 528-532