CMOS chemical microsensors based on resonant cantilever beams

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3328, Issue , 1998, Pages 233-243

  Lange, Dirk ^a   Koll, Andreas ^a   Brand, Oliver ^a   Baltes, Henry ^a  

^a ETH ZURICH   (Switzerland)

Author keywords

Microbalance; Poly(etherurethane); Resonant chemical sensor; Volatile Organic Compound (VOC)

Indexed keywords

ATOMIC FORCE MICROSCOPY; BRIDGE CIRCUITS; CANTILEVER BEAMS; CHEMICAL SENSORS; CONCRETE BRIDGES; ETHANOL; FULLERENES; HEATING; INTELLIGENT STRUCTURES; MEMS; MICROELECTROMECHANICAL DEVICES; MICROSENSORS; MICROWAVE HEATING; NANOCANTILEVERS; ORGANIC COMPOUNDS; RESONANCE; SENSORS; THICKNESS MEASUREMENT; TOLUENE;

BEAM VIBRATION; CHEMICAL GAS SENSORS; CHEMICAL MICROSENSORS; CMOS-MEMS; LAYER THICKNESSES; MICROBALANCE; MW HEATING; PIEZO-RESISTORS; POLY(ETHERURETHANE); QUALITY FACTOR (Q FACTOR); RESONANCE FREQUENCIES; RESONANT CHEMICAL SENSOR; SENSITIVE AREA; STATIC POWER; TEMPERATURE ELEVATION; VOLATILE ORGANIC COMPOUND (VOC); WHEATSTONE BRIDGES;

VOLATILE ORGANIC COMPOUNDS;

EID: 58649095925     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.320174     Document Type: Conference Paper

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