Thermal evolution of Er silicate thin films grown by rf magnetron sputtering

Journal of Physics Condensed Matter

Volumn 20, Issue 45, 2008, Pages

  Lo Savio, R ^a   Miritello, M ^a   Iacona, F ^b   Piro, A M ^a   Grimaldi, M G ^a   Priolo, F ^a  

^a UNIVERSITY OF CATANIA   (Italy)

^b CNR IMM   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTIONS; CHEMICAL REACTIVITY; DEFECT DENSITY; ERBIUM; GRAFTING (CHEMICAL); LIGHT EMISSION; LUMINESCENCE; MAGNETRON SPUTTERING; MAGNETRONS; OPTICAL PROPERTIES; OXYGEN; OXYGEN VACANCIES; RARE EARTH ELEMENTS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICATES; SILICON; SILICON COMPOUNDS; SUBSTRATES; SYNTHESIS (CHEMICAL); THERMAL SPRAYING; THIN FILMS; VACANCIES; X RAY DIFFRACTION ANALYSIS;

ANNEALING TEMPERATURES; CRYSTALLINE STRUCTURES; LIFE-TIMES; PL INTENSITIES; PL SIGNALS; RAPID THERMAL TREATMENTS; RARE EARTH SILICATES; RF MAGNETRON SPUTTERING; RUTHERFORD BACKSCATTERINGS; SI SUBSTRATES; SILICATE THIN FILMS; THERMAL EVOLUTIONS;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 58149350120     PISSN: 09538984     EISSN: 1361648X     Source Type: Journal    
DOI: 10.1088/0953-8984/20/45/454218     Document Type: Article

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