Epitaxial growth and Ohmic contacts in Mgx Zn1-x OTiNSi (111) heterostructures

Applied Physics Letters

Volumn 93, Issue 25, 2008, Pages

  Jin, Chunming ^a   Wei, Wei ^b   Zhou, Honghui ^b,c   Yang, Tsung Han ^a   Narayan, Roger J ^a  

^a USA and North Carolina State University   (United States)

^b North Carolina State University   (United States)

^c LOS ALAMOS NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BUFFER LAYERS; CRYSTALS; ELECTRIC CONTACTORS; ELECTRON MICROSCOPES; ELECTRONIC PROPERTIES; EPITAXIAL FILMS; EPITAXIAL GROWTH; FILM GROWTH; GROWTH (MATERIALS); HETEROJUNCTIONS; LIGHT METALS; MAGNESIUM; MAGNESIUM PRINTING PLATES; MOLECULAR BEAM EPITAXY; NITRIDES; OHMIC CONTACTS; OPTICAL WAVEGUIDES; OXIDE FILMS; OXIDES; PULSED LASER APPLICATIONS; PULSED LASER DEPOSITION; SEMICONDUCTING SILICON COMPOUNDS; THIN FILM DEVICES; THIN FILMS; TITANIUM; TITANIUM COMPOUNDS; TITANIUM NITRIDE; TITANIUM OXIDES; ZINC OXIDE;

CONTACT BEHAVIORS; HETEROSTRUCTURE; HETEROSTRUCTURES; O THIN FILMS; OHMIC ELECTRODES; PULSED LASERS; SILICON SUBSTRATES; SPINEL LAYERS; X-RAY DIFFRACTIONS; ZINC OXIDE THIN FILMS;

ZINC;

EID: 58149171635     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3054347     Document Type: Article

References (24)

1. Z. C. Jin and C. G. Grannqvist, Appl. Phys. Lett. 51, 149 (1987).
2. J. Aranovich, A. Ortiz, and R. H. Bube, J. Vac. Sci. Technol. 16, 994 (1979).
3. S. Maniv and A. Zangvil, J. Appl. Phys. 49, 2787 (1978).
4. D. Persegol, E. Pic, and J. Plantier, J. Appl. Phys. 62, 2563 (1987).
5. Ü. Özgür, Ya. I. Alivov, C. Liu, A. Teke, M. A. Reshchikov, S. Dogan, V. Avrutin, S.-J. Cho, and H. Morkoc, J. Appl. Phys. 98, 041301 (2005).
6. R. F. Service, Science 276, 895 (1997).
7. Z. K. Tang, G. K. L. Wong, P. Yu, M. Kawasaki, A. Ohtomo, H. Koinuma, and Y. Segawa, Appl. Phys. Lett. 72, 3270 (1998).
8. H.-K. Kim, S.-H. Han, T.-Y. Seong, and W.-K. Choi, Appl. Phys. Lett. 77, 1647 (2000).
9. C. Jin, R. Narayan, A. Tiwari, H. Zhou, A. Kvit, and J. Narayan, Mater. Sci. Eng., B 117, 348 (2005).
10. I. Dion, F. Rouais, L. Trut, C. Baquey, J. R. Monties, and P. Havlik, Biomaterials 14, 169 (1993).
11. S. Windecker, I. Mayer, G. De Pasquale, W. Maier, O. Dirsch, P. De Groot, Y. P. Wu, G. Noll, B. Leskosek, B. Meier, and O. M. Hess, Circulation 104, 928 (2001).
12. J. Narayan, P. Tiwari, X. Chen, J. Singh, R. Chowdhury, and T. Zheleva, Appl. Phys. Lett. 61, 1290 (1992).
13. A. K. Sharma, J. Narayan, C. Jin, A. Kvit, S. Chattopadhyay, and C. Lee, Appl. Phys. Lett. 76, 1458 (2000).
14. A. K. Sharma, R. Kalyanaraman, R. J. Narayan, S. Oktyabrsky, and J. Narayan, Mater. Sci. Eng., B 79, 123 (2001).
15. S. Liste, P. Gonzalez, J. Serra, J. P. Borrajo, S. Chiussi, B. Leon, M. Perez-Amor, J. Garcia Lopez, F. J. Ferrer, Y. Morilla, and M. A. Respaldiza, Thin Solid Films 453, 219 (2004).
16. Y. Yamada, N. Suzuki, T. Makino, and T. Yoshida, J. Vac. Sci. Technol. A 18, 83 (2000).
17. T. Yoshida, S. Takeyama, Y. Yamada, and K. Mutoh, Appl. Phys. Lett. 68, 1772 (1996).
18. D. B. Geohegan, A. A. Puretzky, G. Duscher, and S. J. Pennycook, Appl. Phys. Lett. 72, 2987 (1998).
19. T. Mimemoto, Y. Hashimoto, T. Satoh, T. Negami, H. Takakura, and Y. Hamakawa, J. Appl. Phys. 89, 8327 (2001).
20. C. Harada, H.-J. Ko, H. Makino, and T. Yao, Mater. Sci. Semicond. Process. 6, 539 (2003).
21. A. K. Sharma, J. Narayan, C. Jin, A. Kvit, C. W. Teng, J. F. Muth, R. M. Kolbas, and O. W. Holland, Appl. Phys. Lett. 75, 3327 (1999).
22. J. Narayan, A. K. Sharma, A. Kvit, C. Jin, J. F. Muth, and O. W. Holland, Solid State Commun. 121, 9 (2002).
23. K. Choi, P. Lysaght, H. Alshareef, C. Huffman, H.-C. Wen, R. Harris, H. Luan, P. Y. Hung, C. Sparks, M. Cruz, K. Matthews, P. Majhi, and B. H. Lee, Thin Solid Films 486, 141 (2005).
24. K. B. Sundaram and A. Khan, J. Vac. Sci. Technol. A 15, 428 (1996).