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Volumn 255, Issue 7, 2009, Pages 4259-4266

Experimental study of the voids in the electroless copper deposits and the direct measurement of the void fraction based on the scanning electron microscopy images

Author keywords

Copper; Electroless plating; Over etching; Scanning electron microscopy; Void

Indexed keywords

COPPER; COPPER DEPOSITS; DEPOSITS; ELECTROLESS PLATING; EPOXY RESINS; IMAGE PROCESSING; MATLAB; SUBSTRATES; TEMPERATURE; VOID FRACTION;

EID: 58149085271     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.11.015     Document Type: Article
Times cited : (27)

References (15)
  • 4
    • 58149083955 scopus 로고    scopus 로고
    • The diamond pyramid structure observed on the surface of electroless copper deposit and its atom model
    • Indian National Academy of Engineering
    • Wu X., and Sha W. The diamond pyramid structure observed on the surface of electroless copper deposit and its atom model. Advances in Manufacturing Technology (ICAMT). Indian National Academy of Engineering (2008) I10
    • (2008) Advances in Manufacturing Technology (ICAMT)
    • Wu, X.1    Sha, W.2
  • 9
    • 58149085512 scopus 로고    scopus 로고
    • C.R. Shipley Jr., Method of electroless deposition on a substrate and catalyst solution therefore. United States Patent 3,011,920 (1961).
    • C.R. Shipley Jr., Method of electroless deposition on a substrate and catalyst solution therefore. United States Patent 3,011,920 (1961).
  • 10
    • 58149101517 scopus 로고    scopus 로고
    • E.D. D'Ottavio. Colloidal metal activating solutions for use in chemically plating non-conductors and process of preparing such solutions. United States Patent 3,532,518 (1970).
    • E.D. D'Ottavio. Colloidal metal activating solutions for use in chemically plating non-conductors and process of preparing such solutions. United States Patent 3,532,518 (1970).


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.