Electrochemical processing of nanoscale Si thin film in a hydrophobic room-temperature molten salt

ECS Transactions

Volumn 11, Issue 28, 2007, Pages 13-24

  Nishimura, Yusaku ^a   Fukunaka, Yasuhiro ^a   Nohira, Toshiyuki ^a   Hagiwara, Rika ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CHLORINE COMPOUNDS; ELECTRODEPOSITION; ELECTRODES; ELECTROLYSIS; ENERGY DISPERSIVE SPECTROSCOPY; SILICON COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

CYCLIC VOLTAMMOGRAMS; DENSE THIN FILMS; ELECTROCHEMICAL PROCESSING; ELECTRODEPOSITED FILMS; POTENTIOSTATIC ELECTROLYSIS; PROPYLENE CARBONATE; ROOM TEMPERATURE MOLTEN SALT; TETRABUTYL-AMMONIUM CHLORIDE;

THIN FILMS;

EID: 57749188049     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.2931338     Document Type: Conference Paper

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