Structural and optical studies on hot wire chemical vapour deposited hydrogenated silicon films at low substrate temperature

Solar Energy Materials and Solar Cells

Volumn 93, Issue 2, 2009, Pages 199-205

  Gogoi, Purabi ^a   Agarwal, Pratima ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY GUWAHATI   (India)

Author keywords

Amorphous silicon; HWCVD; Hydrogen dilution; Nanocrystalline silicon

Indexed keywords

AMORPHOUS FILMS; FLOW RATE; HYDROGEN; HYDROGEN BONDS; HYDROGENATION; NANOCRYSTALLINE ALLOYS; NANOCRYSTALLINE MATERIALS; NANOCRYSTALLINE SILICON; NONMETALS; OPTICAL FILMS; OPTICAL PROPERTIES; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTING SILICON COMPOUNDS; SILANES; SILICON; WIRE;

ATOMIC HYDROGENS; BOND ANGLES; CHEMICAL VAPOUR DEPOSITIONS; CHEMICAL VAPOURS; GROWING SURFACES; HOT WIRE CHEMICAL VAPOUR DEPOSITIONS; HOT WIRES; HWCVD; HYDROGEN DILUTION; HYDROGEN FLOW RATES; HYDROGENATED SILICONS; OPTICAL STUDIES; SUBSTRATE TEMPERATURES;

AMORPHOUS SILICON;

EID: 57649176605     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2008.09.058     Document Type: Article

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