Optical metrology of micro- And nanostructures at PTB: Status and future developments

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7155, Issue , 2008, Pages

  Bodermann, Bernd ^a   Buhr, Egbert ^a   Ehref, Gerd ^a   Scholze, Frank ^a   Wurm, Matthias ^a  

^a PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

Author keywords

Cd metrology; Diffractometry; EUV; Microscopy; Nanometrology; Rigorous modelling; Scatterometry

Indexed keywords

ATOMIC FORCE MICROSCOPY; DIFFRACTION; DIFFRACTOMETERS; MEASUREMENTS; METEOROLOGICAL INSTRUMENTS; MICROSCOPES; NANOSTRUCTURES; TECHNOLOGICAL FORECASTING; THREE DIMENSIONAL; ULTRAVIOLET DEVICES;

CD METROLOGY; DIFFRACTOMETRY; EUV; MICROSCOPY; NANOMETROLOGY; RIGOROUS MODELLING; SCATTEROMETRY;

OPTICAL MICROSCOPY;

EID: 57649126619     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814531     Document Type: Conference Paper

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