Influence of deposition conditions on mechanical and tribological properties of nanostructured TiN/CNx multilayer films

Surface and Coatings Technology

Volumn 203, Issue 8, 2009, Pages 967-975

  Vyas, Anand ^a   Li, K Y ^b   Shen, Y G ^b  

^a HONG KONG POLYTECHNIC UNIVERSITY   (Hong Kong)

^b CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

Hardness; Pin on disc; Scratch test; Tin CNx; X ray photoelectron spectroscopy

Indexed keywords

ADHESION; ATOMIC SPECTROSCOPY; CARBON NITRIDE; ELECTRON SPECTROSCOPY; EMISSION SPECTROSCOPY; FRICTION; HARDNESS; LEAKAGE (FLUID); MANGANESE COMPOUNDS; MECHANICAL PROPERTIES; MICROSTRUCTURE; MULTILAYERS; NANOINDENTATION; NITRIDES; OPTICAL MULTILAYERS; PHOTOELECTRICITY; PHOTOELECTRON SPECTROSCOPY; PHOTOIONIZATION; PHOTONS; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SILICON WAFERS; SPECTRUM ANALYSIS; TESTING; TIN; TITANIUM CARBIDE; TITANIUM COMPOUNDS; TITANIUM NITRIDE; TRIBOLOGY; X RAY ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

ADHESION TESTS; ADHESIVE PROPERTIES; ATOMIC FORCES; BILAYER THICKNESSES; CHEMICAL STATES; CLOSED LOOPS; COHESIVE STRENGTHS; CRITICAL LOADS; DEPOSITION CONDITIONS; DEPOSITION PROCESSES; ELASTIC RECOVERIES; FRICTION COEFFICIENTS; LAYER THICKNESSES; MAXIMUM HARDNESSES; MAXIMUM LOADS; NANOINDENTATION MEASUREMENTS; NANOSTRUCTURED; OPTICAL EMISSION MONITORS; PIN ON DISC; ROCKWELL; SCRATCH TEST; SCRATCH TESTS; SI(100); STEEL SUBSTRATES; TIN LAYERS; TIN/CNX; TRIBOCHEMICAL WEARS; TRIBOLOGICAL PROPERTIES; TRIBOMETER; UNBALANCED MAGNETRON SPUTTERING; WEAR PERFORMANCES; X-RAY DIFFRACTIONS; X-RAY PHOTOELECTRON SPECTROSCOPIES; XPS ANALYSES;

MULTILAYER FILMS;

EID: 57549099438     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2008.09.019     Document Type: Article

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