TiCl4, as a precursor in the TiN deposition by ALD and PEALD

Proceedings - Electrochemical Society

Volumn 1, Issue , 2004, Pages 361-368

  Elers, Kai Erik ^a   Winkler, Jerry ^a   Marcus, Steven ^a  

^a ASM AMERICA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA; CHEMICAL VAPOR DEPOSITION; CMOS INTEGRATED CIRCUITS; CONCENTRATION (PROCESS); CRYSTAL GROWTH; DIFFUSION; DYNAMIC RANDOM ACCESS STORAGE; INTEGRATED CIRCUITS; METALLIZING; REDUCTION; THIN FILMS;

ATOMIC LAYER DEPOSITION (ALD); PERCURSORS; PLASMA PULSING PARAMETERS;

TITANIUM NITRIDE;

EID: 5744235473     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)

1. J.Y. Kim, Y. Kim, H. Jeon, Jpn. J. Appl. Phys., 42 (2003) 414.
2. J.W. Elam, M. Schuisky, J.D. Ferguson, S.M. George, Thin Solid Films, 436, (2003) 145.
3. L. Hiltunen, M. Leskela, M. Makela, L. Niinisto, E. Nykanen, P. Soininen, Thin Solid Films, 166 (1988) 149.
4. M. Ritala, M. Leskela, E. Rauhala, P. Haussalo, J. Electrochem. Soc., 142 (1995) 2731.
5. K.-E. Elers, V. Saanila, P.J. Soininen, S. Haukka, in Advanced Metallization Conf. 2000. Mater. Res. Soc. Proc. VLSI XV, Material Research Society, Warrendale, PA 2001. p. 295.
6. M. Juppo, M. Ritala, M. Leskela, J. Electrochem. Soc., 147 (2000) 3377.
7. K.-E. Elers, V. Saanila, P.J. Soininen, W.-M. Li, J.T. Kostama, S. Haukka, J. Juhanoja, W.F.A. Besling, Chem. Vap. Deposition, 8 (2002) 149.
8. K.-E. Elers, V. Saanila, P.J. Soininen, W.-M. Li, J.T. Kostama, S. Haukka, J. Juhanoja, W.F.A. Besling, Thin Solid Films, 434 (2003) 94.
9. A.F. Mayadas, M. Shatzkes, Phys. Rev, B1(1970)1382.