Multi-layer BARCs for hyper-NA immersion lithography process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6519, Issue PART 2, 2007, Pages

  Sakaida, Yasushi ^a   Takei, Satoshi ^a   Nakajima, Makoto ^a   Kimura, Shigeo ^a   Sakaguchi, Takahiro ^a   Hashimoto, Keisuke ^a   Imamura, Hikaru ^a  

^a NISSAN CHEMICAL INDUSTRIES LTD   (Japan)

Author keywords

BARC; Hard mask; Hyper NA; Immersion; Multi layer process; Resist profile; Si ARC; Sublimation

Indexed keywords

LIGHT POLARIZATION; LITHOGRAPHY; MULTILAYERS; OPTICAL SYSTEMS; PROCESS CONTROL; REFLECTION; SUBLIMATION;

HARD MASKS; IMMERSION; MULTI-LAYER PROCESS; PATTERN COLLAPSE; RESIST PROFILES;

ANTIREFLECTION COATINGS;

EID: 35148825595     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.711382     Document Type: Conference Paper

References (4)

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2. I.Nishimura et al.,"Comparison of single-, bi-, tri-layer resist process," Proc. SPIE, 5753, 611 (2005).
3. V. Sipani, et al,"Fundamental characterization of silicon-containing spin-on hardmask for 193nm photolithography," Proc. SPIE, 6153, 61532U (2006).
4. M. Nakajima, et al,"Design and Development of Next Generation Bottom Anti-Reflective Coatings for 45nm Process with Hyper NA Lithography, "Proc. SPIE, 6153, 61532L (2006).