Fabrication of DNA nanowires by orthogonal self-assembly and DNA intercalation on a Au patterned Si/SiO2 surface

Langmuir

Volumn 24, Issue 22, 2008, Pages 13203-13211

  Kobayashi, Katsuaki ^a   Tonegawa, Naoya ^a   Fujii, Sho ^a   Hikida, Jiro ^a   Nozoye, Hisakazu ^b   Tsutsui, Ken ^c   Wada, Yasuo ^c   Chikira, Makoto ^a   Haga, Masa Aki ^a  

^a CHUO UNIVERSITY   (Japan)

^b ULVAC PHI Inc   (Japan)

^c TOYO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACIDS; ATOMIC FORCE MICROSCOPY; COPPER; DNA; ELECTRIC WIRE; ELECTRODES; GENES; HIGH PERFORMANCE LIQUID CHROMATOGRAPHY; MASS SPECTROMETRY; MICA; MOLECULAR ORIENTATION; NANOPARTICLES; NANOWIRES; NUCLEIC ACIDS; ORGANIC ACIDS; PALLADIUM; SECONDARY ION MASS SPECTROMETRY; SELF ASSEMBLY; SILICATE MINERALS; SILICON COMPOUNDS; ZIRCONIUM; ZIRCONIUM COMPOUNDS;

ANCHOR GROUPS; ATOMIC FORCES; AU ELECTRODES; CAPTURE EFFICIENCIES; CU METALLIZATION; CU NANOWIRES; DNA INTERCALATIONS; HIGH RESISTANCES; ION MASS SPECTROMETRIES; METALLIC BEHAVIORS; MICA SURFACES; MOLECULAR COMBING; OPTIMAL CONDITIONS; OPTIMAL NUMBERS; PATTERNED SURFACES; PD NANO PARTICLES; PHOSPHONATE; PHOSPHONATE GROUPS; RU COMPLEXES; SELECTIVE IMMOBILIZATIONS; SURFACE COVERAGES; SURFACE HYDROPHOBICITIES; TIME OF FLIGHTS;

GOLD;

3 (4 METHOXYBENZOYL)PROPIONIC ACID; 3-(4-METHOXYBENZOYL)PROPIONIC ACID; DNA; GOLD; INTERCALATING AGENT; METAL; NANOCOMPOSITE; NANOPARTICLE; PALLADIUM; PHOSPHONIC ACID DERIVATIVE; PROPIONIC ACID DERIVATIVE; SILICON; SILICON DIOXIDE; ZIRCONIUM;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; ELECTRODE; MASS SPECTROMETRY; METHODOLOGY; SURFACE PROPERTY; TIME;

DNA; ELECTRODES; GOLD; INTERCALATING AGENTS; MASS SPECTROMETRY; METALS; MICROSCOPY, ATOMIC FORCE; NANOCOMPOSITES; NANOPARTICLES; PALLADIUM; PHOSPHONIC ACIDS; PROPIONIC ACIDS; SILICON; SILICON DIOXIDE; SURFACE PROPERTIES; TIME FACTORS; ZIRCONIUM;

EID: 57349181789     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la801293e     Document Type: Article

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