New high index fluids: exploiting anomalous dispersion for immersion lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6923, Issue , 2008, Pages

  Costner, Elizabeth A ^a   Matsumoto, Kazuya ^a,b   Long, Brian K ^a   Taylor, J Christopher ^a   Wojtczak, William ^c   Willson, C Grant ^a  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^c SACHEM Inc   (United States)

Author keywords

193 nm; Absorbance; Alkanes; Ammonium salts; High index fluid; Immersion lithography

Indexed keywords

AMMONIUM COMPOUNDS; HYDROCARBONS; NICKEL OXIDE; OPTICAL PROPERTIES; OPTOELECTRONIC DEVICES; PARAFFINS; PHOTOLITHOGRAPHY; REFRACTIVE INDEX; SALTS;

193 NM; ABSORBANCE; ALKANES; AMMONIUM SALTS; HIGH INDEX FLUID; IMMERSION LITHOGRAPHY;

FLUIDS;

EID: 57349137308     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772979     Document Type: Conference Paper

References (20)

1. Burnett, J. H. and Kaplan, S. G., "Measurement of the refractive index and thermo-optic coefficient of water near 193 nm," JM3 3(1), 68-72 (2004).
2. Rothschild, M., Bloomstein, T. M., Kunz, R. R., Liberman, V., Switkes, M., Palmacci, S. T., Sedlacek, J. H. C., Hardy, D. and Grenville, A., "Liquid immersion lithography: Why, how, and when?" J. Vac. Sci. Technol. B 22(6), 2877-2881 (2004).
3. French, R. H., Sewell, H., Yang, M. K., Peng, S. P., McCafferty, D., Qiu, W., Wheland, R. C., Lemon, M. F., Markoya, L. and Crawford, M. K., "Imaging of 32-nm 1:1 lines and spaces using 193-nm immersion interference lithography with second-generation immersion fluids to achieve a numerical aperture of 1.5 and a k1 of 0.25," JM3 4(3), 031103-1 -031103-14(2005).
4. Lopez-Gejo, J., Kunjappu, J. T., Zhou, J., Smith, B. W., Zimmerman, P., Conley, W. and Turro, N. J., "Polycycloalkanes as Potential Third-Generation Immersion Fluids for Photolithography at 193 nm," Chem. Mater. 19(15), 3641-3647 (2007).
5. Zimmerman, P. A., van Peski, C., Rice, B., Byers, J., Turro, N. J., Lei, X., Gejo, J. L., Liberman, V., Palmacci, S., Rothschild, M., Whittaker, A., Blakey, I., Chen, L., Dargaville, B. and Liu, H., "Status of high-index materials for generation-three 193nm immersion lithography," J. Photo. Sci. Technol. 20(5), 643-650 (2007).
6. Wooten, F., [Optical Properties of Solids], Academic Press, New York, (1972).
7. French, R. H., Peng, S. and Wheland, R. C., "Use of highly purified hydrocarbons in vacuum ultraviolet applications", US 2005286031, 34 pp (2005).
8. Lopez-Gejo, J., Kunjappu, J. T., Conley, W., Zimmerman, P. and Turro, N. J., "Methods for the synthesis and purification of polycycloalkane candidates for photolithography immersion fluids at 193 nm: requirements for removal of oxygen," JM3 6(3), 033003/1-033003/7 (2007).
9. Parsons, B. F. and Chandler, D. W., "On the Dissociation of van der Waals Clusters of X2-Cyclohexane (X = O, Cl) Following Charge-Transfer Excitation in the Ultraviolet," J. Phys. Chem. A. 107(49), 10544-10553 (2003).
10. Synowicki, R. A., Pribil, G. K., Cooney, G., Herzinger, C. M., Green, S. E., French, R. H., Yang, M. K., Burnett, J. H. and Kaplan, S., "Fluid refractive index measurements using rough surface and prism minimum deviation techniques," J. Vac. Sei. Technol. B 22(6), 3450-3453 (2004).
11. Costner, E., Taylor, J. C., Caporale, S., Wojtczak, W., Dewulf, D., Conley, W. and Willson, C. G., "New high-index fluids for immersion lithography," Proc. SPIE 6153, 61530B/1-B/11 (2006).
12. Yadav, L. D. S., [Organic Spectroscopy], Kluwer Academic Publishers, Boston, (2005).
13. Holmes, J. L. and Lossing, F. P., "Ionization energies of homologous organic compounds and correlation with molecular size," Org. Mass Spectrom. 26(6), 537-41 (1991).
14. Harder, P. M. and Shedd, T. A., "Contact angles and liquid loss behavior of high index fluids," Proc. SPIE 6533, 653305/1-653305/12 (2007).
15. Sewell, H., Mulkens, J., Graeupner, P., McCafferty, D., Markoya, L., Donders, S., Samarakone, N. and Duesing, R., "Extending immersion lithography with high-index materials: Results of a feasibility study," Proc. SPIE 6520, 65201M/1-65201M/12 (2007).
16. Furukawa, T., Kishida, T., Miyamatsu, T., Kawaguchi, K., Yamada, K., Tominaga, T., Slezak, M. and Hieda, K., "High-refractive index material design for ArF immersion lithography," Proc. SPIE 6519, 65190B/1-65190B/10 (2007).
17. Zhou, J., Fan, Y., Bourov, A. and Smith, B. W., "Inorganic immersion fluids for ultrahigh numerical aperture 193 nm lithography," Appl Opt 45(13), 3077-3082 (2006).
18. Fox, M. F. and Hunter, T. F., "Charge-transfer-to-solvent spectra," Nature 223(5202), 177-8 (1969).
19. Stein, G. and Treinin, A., "Absorption spectra of anions in solution. III. Ionic effects," Trans. Farad. Soc. 56(1), 1393-403 (1960).
20. Liberman, V., Rothschild, M., Palmacci, S. T., Zimmerman, P. A. and Grenville, A., "Laser durability studies of high index immersion fluids: fluid degradation and optics contamination effects," Proc. SPIE 6520, 652035/1-652035/10 (2007).