Methods for the synthesis and purification of polycycloalkane candidates for photolithography immersion fluids at 193 nm: Requirements for removal of oxygen

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 6, Issue 3, 2007, Pages

  López Gejo, Juan ^a   Kunjappu, Joy T ^b   Conley, Will ^c   Zimmerman, Paul ^d   Turro, Nicholas J ^a  

^a Columbia University Department of Chemistry ^*  (United States)

^b CITY UNIVERSITY OF NEW YORK   (United States)

^c FREESCALE SEMICONDUCTOR INC   (United States)

^d SEMATECH   (United States)

Author keywords

193 nm immersion microlithography; Oxygen complex; Polycycloalkanes; Purification; Second generation immersion fluids; VUV solvents

Indexed keywords

OXYGEN; PHOTOLITHOGRAPHY; PURIFICATION; REFRACTIVE INDEX; SYNTHESIS (CHEMICAL);

193-NM IMMERSION MICROLITHOGRAPHY; SECOND-GENERATION IMMERSION FLUIDS;

PARAFFINS;

EID: 40049101423     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.2778641     Document Type: Article

References (20)