New high index fluids for immersion lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6153 I, Issue , 2006, Pages

  Costner, Elizabeth ^a   Taylor, J Christopher ^a   Caporale, Stefan ^a   Wojtczak, William ^b   Dewulf, Dean ^b   Conley, Will ^c   Willson, C Grant ^a  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

^b SACHEM Inc   (United States)

^c SEMATECH   (United States)

Author keywords

193 nm; Absorbance; Aqueous salt solutions; High index fluid; Immersion lithography

Indexed keywords

LIGHT ABSORPTION; LITHOGRAPHY; OPTICAL RESOLVING POWER; REFRACTION; SALTS; SEMICONDUCTOR MATERIALS; VISCOSITY;

193 NM; ABSORBANCE; AQUEOUS SALT SOLUTIONS; FLUID TESTING; HIGH INDEX FLUID; HIGH INDEX FLUIDS; IMMERSION LITHOGRAPHY; RESOLUTION ENHANCING CAPABILITY;

REFRACTIVE INDEX;

EID: 33745623699     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656637     Document Type: Conference Paper

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