The structural, optical and magnetic properties and anomalous Hall effect of InMnP:Zn epilayers

New Journal of Physics

Volumn 10, Issue , 2008, Pages

  Shon, Yoon ^a   Lee, Sejoon ^a   Kim, D Y ^a   Kang, T W ^a   Yoon, Chong S ^b   Kim, Eun Kyu ^b   Lee, Jeong Ju ^c  

^a Dongguk University   (South Korea)

^b Hanyang University   (South Korea)

^c Gyeongsang National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION; ELECTRIC CONDUCTIVITY; EPILAYERS; EPITAXIAL GROWTH; FERROMAGNETIC MATERIALS; FERROMAGNETISM; FLUID CATALYTIC CRACKING; GALVANOMAGNETIC EFFECTS; GYRATORS; HALL EFFECT; HOLE CONCENTRATION; HOLOGRAPHIC INTERFEROMETRY; LANTHANUM COMPOUNDS; MAGNETIC FIELD EFFECTS; MAGNETIC MATERIALS; MAGNETIC PROPERTIES; MAGNETIC SEMICONDUCTORS; MANGANESE; ORGANIC CHEMICALS; ORGANIC COMPOUNDS; QUANTUM INTERFERENCE DEVICES; SEMICONDUCTOR MATERIALS; SEMICONDUCTOR QUANTUM WELLS; SIPHONS; STRUCTURAL PROPERTIES; TRANSPORT PROPERTIES; X RAY DIFFRACTION ANALYSIS; ZINC;

ALMOST CONSISTENT; ANOMALOUS HALL EFFECTS; BAND GAPS; CUBIC STRUCTURES; DILUTED MAGNETIC SEMICONDUCTORS; ELECTRON DIFFRACTION ANALYSES; EPILAYERS GROWN; EPITAXIAL DEPOSITIONS; FCC LATTICES; FERROMAGNETIC SEMICONDUCTORS; FERROMAGNETIC STATES; FERROMAGNETIC TRANSITION TEMPERATURES; MN ATOMS; MN DOPING; OPTICAL-; ORGANIC CHEMICAL VAPOR DEPOSITIONS; PARAMAGNETIC STATES; PHOTOLUMINESCENCE MEASUREMENTS; SEMI-CONDUCTORS; SUBSEQUENT ANNEALING; SUPERCONDUCTING QUANTUM INTERFERENCE DEVICES; TETRAHEDRALLY COORDINATED; X-RAY DIFFRACTIONS;

MANGANESE COMPOUNDS;

EID: 57249114532     PISSN: 13672630     EISSN: None     Source Type: Journal    
DOI: 10.1088/1367-2630/10/11/115002     Document Type: Article

References (35)

1. Dietl T, Ohno H, Matsukura F, Cibert J and Ferrand D 2000 Science 287 1019
2. Dietl T, Ohno H and Matsukura F 2001 Phys. Rev. B 63 195205
3. Bachmann K J, Buechler E, Miller B I, McFee J H and Thiel F A 1997 J. Cryst. Growth 39 137
4. Munekata H, Ohno H, von Molnar S, Segmuller A, Chang L L and Esaki L 1989 Phys. Rev. Lett. 63 1849
5. Ohno H 1998 Science 281 951
6. Shon Y, Kwon Y H, Kim D Y, Fan X, Fu D J and Kang T W 2001 Japan. J. Appl. Phys. 40 5304
7. Sonoda S, Shimizu S, Sasaki T, Yamamoto Y and Hori H 2002 J. Cryst. Growth 237-239 1358
8. Baik J M, Shon Y, Kang T W and Lee J L 2004 Appl. Phys. Lett. 84 1120
9. Theodoropoulou N, Hebard A F, Overberg M E, Abemathy C R, Pearton S J, Chu S N G and Wilson R G 2002 Phys. Rev. Lett. 89 107203
10. Chen X et al 2002 Appl. Phys. Lett. 81511
11. Jeon H C, Jeong Y S, Kang T W, Kim T W, Chung K J, Jhe W and Song S A 2002 Adv. Mater. 14 1725
12. Lee M K, Li C B, Liu C S, Fan S J, Fu D J, Shon Y and Kang T W 2004 J. Appl. Phys. 95 755
13. Lee S, Shon Y, Lee S-W, Hwang S J, Lee H S, Kang T W and Kim D Y 2006 Appl. Phys. Lett. 88 212513
14. Lee S, Kim D Y, Shon Y and Yoon C S 2006 Appl. Phys. Lett. 89 022120
15. Nazmul A M, Sugahara S and Tanaka M 2003 Phys. Rev. B 67 241308
16. Shon Y et al 2004 Appl. Phys. Lett. 84 2310
17. Shon Y et al 2004 Appl. Phys. Lett. 85 1763
18. Shon Y et al 2005 J. Cryst. Growth 281 501
19. Poddar P, Sahoo Y, Srikanth H and Prasad P N 2005 Appl. Phys. Lett. 87 062506
20. Ohno H 1999 J. Magn. Magn. Mater. 200 110
21. Hirsch P, Howie A, Nicholson R B, Pashley D W and Whelan M J 1977 Electron Microscopy of Thin Crystals (Malabar, FL: Krieger) p 378
22. Kreissl J, Ulrici W, El-Metoui M, Vasson A-M, Vasson A and Gavaix A 1996 Phys. Rev. B 54 10508
23. Schneider J, Kaufmann U, Wilkening W, Baeumler M and Kohl F 1987 Phys. Rev. Lett. 59 240
24. Szczytko J, Twardowski A, Swiatek K, Palczewska M, Tanaka M, Hayashi T and Ando K 1999 Phys. Rev. B 60 8304
25. Kim Y, Shon Y, Takamasu T and Yokoi H 2005 Phys. Rev. B 71 73308
26. Shon Y et al 2004 J. Appl. Phys. 96 7022
27. Shon Y, Kwon Y H, Kang T W, Fan X, Fu D J and Kim Y M 2002 J. Cryst. Growth 245 193
28. Shon Y, Kwon Y H, Yuldashev Sh U, Leem J H, Park C S, Fu D J, Kim H J and Kang T W 2002 Appl. Phys. Lett. 81 1845
29. Shon Y et al 2004 J. Appl. Phys. 95 761
30. Eaves L, Smith A W, Skolnick M S and Cockayne B 1982 J. Appl. Phys. 53 4955
31. Huang K and Wessels B W 1990 J. Appl. Phys. 67 6882
32. Hurd C M 1972 The Hall Effect in Metal and Alloys (New York: Plenum)
33. Kawakami R K, Johnston-Halperin E, Chen L F, Hanson M, Guébels N, Speck J S, Gossard A C and Awschalom D D 2000 Appl. Phys. Lett. 11 2379
34. Mathieu R, Svedlindh P, Sadowski J, Swiatek K, Karlsteen M, Kanski J and liver L 2002 Appl. Phys. Lett. 81 3013
35. Ku K C et al 2003 Appl. Phys. Lett. 82 2302