Development of a novel EUV mask protection engineering tool and mask handling techniques

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6607, Issue PART 2, 2007, Pages

  Amemiya, Mitsuaki ^a   Ota, Kazuya ^a   Kamono, Takashi ^a   Kubo, Hiroyoshi ^a   Usui, Youichi ^a   Takikawa, Tadahiko ^a   Taguchi, Takao ^a   Suga, Osamu ^a  

^a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

EUV lithography; EUVL; Mask handling; Particle free; Pumping down; Purging

Indexed keywords

DEFECTS; ELECTRONICS PACKAGING; EXTREME ULTRAVIOLET LITHOGRAPHY; INSPECTION; PURGING;

MASK HANDLING; PARTICLE FREE MASK HANDLING;

MASKS;

EID: 36249009529     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.729035     Document Type: Conference Paper

References (7)

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