Measurement and modeling of Ar/H2CH4 arc jet discharge chemical vapor deposition reactors. I. Intercomparison of derived spatial variations of H atom, C2, and CH radical densities

Journal of Applied Physics

Volumn 102, Issue 6, 2007, Pages

  Rennick, C J ^a   Ma, J ^a   Henney, J J ^a   Wills, J B ^a   Ashfold, M N R ^a   Orr Ewing, A J ^a   Mankelevich, Yu A ^b  

^a UNIVERSITY OF BRISTOL   (United Kingdom)

^b MOSCOW STATE UNIVERSITY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; CARRIER CONCENTRATION; CHARGED PARTICLES; CHEMICAL VAPOR DEPOSITION; PLASMA DENSITY; POLYCRYSTALLINE MATERIALS;

DIODE LASER ABSORPTION SPECTROSCOPY; GAS ACTIVATION; POLYCRYSTALLINE DIAMOND FILMS; ROTATIONAL QUANTUM STATES;

PLASMA JETS;

EID: 34848839525     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2783890     Document Type: Article

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